TOKYO, JAPAN – April 19, 2010 – AWR KK, a division of AWR Corporation, the innovation leader in high-frequency EDA, announced today that the AWR Users Group Meeting (UGM)/Japan is scheduled for Friday, September 10, 2010 at the Advanced Technology Exhibition Hall at TEPIA in Tokyo. The AWR UGM/Japan meeting is an informal event at which designers in Japan who use AWR software tools can network, share useful articles and resources, discuss AWR and general industry issues, and speak with AWR staff about upcoming new products and technologies and future developments.
The 2010 UGM/Japan agenda will feature Dr. John Dunn as guest speaker on the topic of electromagnetics. Dr. Dunn is a former professor of electrical engineering at the University of Colorado, a noted expert in the field of electromagnetics, has written numerous papers and tutorials, and given presentations on the topic at many conferences worldwide. Additional speakers at the event will likely include KEK/Particle Acceleration and Sapphicon Semiconductor as well as the test equipment manufacturers Anritsu and Rohde & Schwarz.
The UGM/Japan provides a forum for the presentation of interesting and informative papers from colleagues working in industry, research and educational institutions, as well as AWR's own simulation experts. Prizes such as the Apple iPad and iPod Touch will be awarded for the top three papers.
Registration and Call for Papers
Participants attending or presenting are required to register at http://web.awrcorp.com/jugm-2010/. Abstracts are due May 1 and final papers are due July 1, 2010. Suggested topics include but are not limited to RFIC and MMIC design, EM analysis of coplanar waveguide structures, LTE system simulation, microwave components, RF and microwave circuit boards, and RF SoCs, SiPs, and modules. More information is available at http://web.awrcorp.com/JUGM-2010/call-for-papers/.
All presentations will be made available for download from the AWR Web site so that users worldwide can benefit, and some presentations may be converted to articles and published in industry-leading magazines and online portals.