SemiGen to Exhibit Advanced Foundry and Thin Film Capabilities at IMS2019
At the International Microwave Symposium (IMS2019), to be held from June 2-7 in Boston, SemiGen will be holding discussions on its full suite of RF products, services and solutions—which include a line of diodes and passive semiconductors, high frequency microwave assembly and testing services and bonding supplies. The company will also be featuring in its Booth 173 its expanding capability to assist RF/microwave hybrid module manufacturers with its foundry requirements and thin film circuit manufacturing needs.
SemiGen’s ion beam milling technology is a dry etching thin film circuit manufacturing technique in which the ions of an inert gas are accelerated from an ion source into the surface of the substrate in order to remove the metals. The advantage of the thin film technology is that it is anisotropic; meaning the removal of the metals is highly specific in the vertical direction, resulting in minimum undercutting of the underlying metals during the etching process. This results in the best and most repeatable thin film traces and spaces, and excellent eutectic value and bond strength.
SemiGen also offers wafer processing of 100 to 150 mm silicon wafers, and Al and AlN substrates up to 4.25 in. Services include photolithography, wet etch, dry etch, metallization, grinding, polishing and in-process metrology. Recent investments in RF test and Hi-Rel environmental test capabilities has also enabled the company to offer solutions for MIL-STD screening of amplifiers, FETs, MMICs, transistors, diodes and other active and passive circuits and components.
Tests are performed and are delivered with full documentation in accordance with MIL-PRF-19500, MIL-PRF-38534, and MIL-PRF-38535 requirements. Element evaluation and screening options from Class H, Class K, TX, TXV, S-level, as well as custom SCD driven requirements, are also available.