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    <title>Semiconductors / Integrated Circuits</title>
    <description>
      <![CDATA[Semiconductors/MMIC/RFIC related products]]>
    </description>
    <link>https://www.microwavejournal.com/rss</link>
    <language>en-us</language>
    <item>
      <title>CEA-Leti Presents Die-to-Wafer Hybrid Bonding At 1 μm Pitch, Removing Bottleneck for AI Hardware</title>
      <description>
        <![CDATA[<p>CEA-Leti announced a major milestone in the evolution of 3D integration for HPC, advanced smart-vision systems and AI, demonstrating a functional test vehicle utilizing D2W hybrid bonding with pitches down to 1 μm. The findings were presented at the ECTC 2026.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45841</guid>
      <pubDate>Fri, 29 May 2026 10:26:19 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/45841-cea-leti-presents-die-to-wafer-hybrid-bonding-at-1-m-pitch-removing-bottleneck-for-ai-hardware</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/News/CEA-Leti-5-29-26.webp?t=1780065928" type="image/jpeg" medium="image" fileSize="194991">
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    </item>
    <item>
      <title>Imec Presents Quantum Dot Qubit Device Using High NA EUV Lithography</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">This week, at ITF World, imec, presents a world first: a quantum dot qubit device fabricated using High NA EUV lithography.&nbsp;</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45811</guid>
      <pubDate>Tue, 26 May 2026 16:35:25 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/45811-imec-presents-quantum-dot-qubit-device-using-high-na-euv-lithography</link>
    </item>
    <item>
      <title>CEA‑Leti to Showcase Integrated Expertise in Microelectronics Reliability at IRPS 2026</title>
      <description>
        <![CDATA[<p>At IRPS 2026, CEA‑Leti will present seven papers that reflect a broad and integrated expertise across device physics, process integration, RF technologies, FD‑SOI, GaN, BEOL reliability and low‑temperature platforms enabling 3D sequential integration. </p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45501</guid>
      <pubDate>Tue, 17 Mar 2026 10:24:48 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/45501-cealeti-to-showcase-integrated-expertise-in-microelectronics-reliability-at-irps-2026</link>
    </item>
    <item>
      <title>Apple’s iPhone 17 Series 5G mmWave Antenna Module Revealed to be Powered by Soitec FD-SOI Substrates</title>
      <description>
        <![CDATA[<p>Recent independent teardown and technical analyses have confirmed that the 5G mmWave antenna module powering Apple’s latest iPhone 17, iPhone 17 Pro and iPhone 17 Pro Max relies on fully depleted silicon-on-insulator (FD-SOI) substrate technology.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45427</guid>
      <pubDate>Mon, 02 Mar 2026 12:00:10 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45427-apples-iphone-17-series-5g-mmwave-antenna-module-revealed-to-be-powered-by-soitec-fd-soi-substrates</link>
    </item>
    <item>
      <title>Compound Semiconductors Enter a New Growth Phrase Powered by AI &amp; Electrification</title>
      <description>
        <![CDATA[<p>Yole Group announced the release of its annual market and technology report, "Status of the Compound Semiconductor Industry 2026 – Focus on Substrates and Epiwafers," highlighting sustained structural growth through 2031.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45394</guid>
      <pubDate>Mon, 23 Feb 2026 08:58:52 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45394-compound-semiconductors-enter-a-new-growth-phrase-powered-by-ai-and-electrification</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/News/yole-2-23-26.webp?t=1771855603" type="image/jpeg" medium="image" fileSize="143501">
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      </media:content>
    </item>
    <item>
      <title>YINCAE Drives Semiconductor Innovation at APEX 2026 — Booth #4130</title>
      <description>
        <![CDATA[<p>YINCAE Advanced Materials Co., Ltd. will exhibit at APEX 2026, March 17–19, at the Anaheim Convention Center in Anaheim, Calif.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45377</guid>
      <pubDate>Wed, 18 Feb 2026 11:36:38 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45377-yincae-drives-semiconductor-innovation-at-apex-2026-booth-4130</link>
    </item>
    <item>
      <title>RTX’s Raytheon to Accelerate Domestic Supply of Critical Material for Commercial and Defense Applications</title>
      <description>
        <![CDATA[<p>Raytheon was awarded a contract from the Air Force Research Laboratory to develop a domestic production capability for thin film lithium niobate (TFLN) wafers, a material essential to high speed, secure communications and advanced sensing systems.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45372</guid>
      <pubDate>Tue, 17 Feb 2026 10:53:56 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45372-rtxs-raytheon-to-accelerate-domestic-supply-of-critical-material-for-commercial-and-defense-applications</link>
    </item>
    <item>
      <title>RF GaN: Geopolitics Fuel Sustained Growth</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">According to Yole Group’s latest report on the RF GaN market, GaN devices play a critical role in high-power RF signal generation and amplification, with growing adoption across telecom infrastructure, defense and satellite communications.&nbsp;</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45331</guid>
      <pubDate>Thu, 05 Feb 2026 09:54:05 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45331-rf-gan-geopolitics-fuel-sustained-growth</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/yole-1-30-26.webp?t=1770304592" type="image/jpeg" medium="image" fileSize="129746">
        <media:title type="plain">yole-1-30-26.jpg</media:title>
      </media:content>
    </item>
    <item>
      <title>Texas Instruments to Acquire Silicon Labs</title>
      <description>
        <![CDATA[<p>Texas Instruments and Silicon Labs announced they have signed a definitive agreement under which Texas Instruments will acquire Silicon Labs for $231.00 per share in an all-cash transaction, representing a total enterprise value of approximately $7.5 billion.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45321</guid>
      <pubDate>Wed, 04 Feb 2026 14:04:16 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45321-texas-instruments-to-acquire-silicon-labs</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/texas-instruments-2-4-26.webp?t=1770231895" type="image/jpeg" medium="image" fileSize="85284">
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    </item>
    <item>
      <title>Siemens Acquires Canopus AI</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">Siemens announced the acquisition of Canopus AI, an innovator in computational and AI-driven metrology solutions, enabling semiconductor manufacturers to achieve new levels of precision and efficiency in wafer and mask inspection processes.&nbsp;</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45318</guid>
      <pubDate>Wed, 04 Feb 2026 09:43:05 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45318-siemens-acquires-canopus-ai</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/Siemens-2-4-26.webp?t=1770216454" type="image/jpeg" medium="image" fileSize="187115">
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    </item>
    <item>
      <title>Northrop Grumman Awarded Contracting Tool to Accelerate American-Made Microelectronics into Military Systems</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">Northrop Grumman is one of the companies selected to receive an award from the Defense Microelectronics Activity (DMEA) for a contracting resource.</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45303</guid>
      <pubDate>Mon, 02 Feb 2026 10:35:54 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45303-northrop-grumman-awarded-contracting-tool-to-accelerate-american-made-microelectronics-into-military-systems</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/NGC-2-2-26.webp?t=1770046762" type="image/jpeg" medium="image" fileSize="197247">
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      </media:content>
    </item>
    <item>
      <title>ICsense Increases In-House ASIC Volume Production Capability with Opening of New Electrical Wafer Sort Cleanroom</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">ICsense has opened a new electronic wafer sort (EWS) cleanroom as part of its latest strategic investment program.&nbsp;</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45274</guid>
      <pubDate>Mon, 26 Jan 2026 08:02:48 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45274-icsense-increases-in-house-asic-volume-production-capability-with-opening-of-new-electrical-wafer-sort-cleanroom</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/ICsense-1-26-26.webp?t=1769433720" type="image/jpeg" medium="image" fileSize="195349">
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      </media:content>
    </item>
    <item>
      <title>NHanced Semiconductors Leads the Semiconductor Industry in Heterogeneous Hybrid Bonding Production</title>
      <description>
        <![CDATA[<p>NHanced Semiconductors announced their new Besi bonding system, further expanding its advanced packaging yield and throughput.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45154</guid>
      <pubDate>Tue, 16 Dec 2025 15:18:56 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45154-nhanced-semiconductors-leads-the-semiconductor-industry-in-heterogeneous-hybrid-bonding-production</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/NHanced-12-16-25.webp?t=1765916736" type="image/jpeg" medium="image" fileSize="215099">
        <media:title type="plain">NHanced-12-16-25.jpg</media:title>
      </media:content>
    </item>
    <item>
      <title>Indium Corporation Launches New Solder Paste for High Print Consistency and Easy Cleanability</title>
      <description>
        <![CDATA[<p>Indium Corporation announced the global availability of SiPaste<sup>®</sup> C312HF, a halogen-free, cleanable solder paste formulated for fine-feature printing.&nbsp;</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45140</guid>
      <pubDate>Thu, 11 Dec 2025 11:32:25 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45140-indium-corporation-launches-new-solder-paste-for-high-print-consistency-and-easy-cleanability</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/indium-12-11-25.webp?t=1765470850" type="image/jpeg" medium="image" fileSize="48297">
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      </media:content>
    </item>
    <item>
      <title>CEA-Leti &amp; STMicroelectronics’ Paper at IEDM 2025 Demonstrates Path to Fully Monolithic</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">CEA-Leti and STMicroelectronics presented results at IEDM 2025 showcasing key enablers for a new high performance and versatile RF Si platform cointegrating best-in-class active and passive devices used in RF and Optical FEM.</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45134</guid>
      <pubDate>Wed, 10 Dec 2025 11:50:56 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45134-cea-leti-and-stmicroelectronics-paper-at-iedm-2025-demonstrates-path-to-fully-monolithic</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/cea-leti-12-10-25.webp?t=1765386244" type="image/jpeg" medium="image" fileSize="125481">
        <media:title type="plain">cea-leti-12-10-25.jpg</media:title>
      </media:content>
    </item>
    <item>
      <title>UMS Unveils New GH10-10, 0.1 µm GaN Technology</title>
      <description>
        <![CDATA[<p style="box-sizing: border-box; overflow-wrap: break-word; font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: start; widows: 2; word-spacing: 0px;">United Monolithic Semiconductors (UMS) announced that its new GH10-10 GaN technology is now fully qualified and already opened in production mode, empowering our customers with high performance, fast time-to-market and greater competitive advantages.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45110</guid>
      <pubDate>Fri, 05 Dec 2025 14:34:04 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45110-ums-unveils-new-gh10-10-01-m-gan-technology</link>
    </item>
    <item>
      <title>Glass Materials for Semiconductor Manufacturing: A Strategic Platform Reshaping the Future of Devices, Process and Supply Chains</title>
      <description>
        <![CDATA[<p>Yole Group announced the release of its new technology and market report, Glass Materials for Semiconductor Manufacturing 2025, a comprehensive study analyzing the rapid rise of glass as a strategic material in semiconductor processes and permanent device architectures.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45080</guid>
      <pubDate>Wed, 26 Nov 2025 08:16:00 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45080-glass-materials-for-semiconductor-manufacturing-a-strategic-platform-reshaping-the-future-of-devices-process-and-supply-chains</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/yole-11-26-25.webp?t=1764163334" type="image/jpeg" medium="image" fileSize="133804">
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    </item>
    <item>
      <title>Semiconductor Industry 2025: Worldwide Dynamics and China’s Strategic Rise Unveiled </title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">Yole Group announced the release of two complementary reports: Overview of the Semiconductor Devices Industry – H2 2025, providing a global assessment of the semiconductor devices market, and China Semiconductor Industry 2025, offering an in-depth analysis of China’s emerging semiconductor supply chain from equipment to devices, including foundries and OSATs.</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/45027</guid>
      <pubDate>Fri, 14 Nov 2025 07:58:40 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/45027-semiconductor-industry-2025-worldwide-dynamics-and-chinas-strategic-rise-unveiled</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/yole-11-14-25.webp?t=1763125442" type="image/jpeg" medium="image" fileSize="147258">
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    </item>
    <item>
      <title>MACOM to Manufacture HRL’s 40 nm GaN-on-SiC Process</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">MACOM Technology Solutions Inc. announced that it has entered into an agreement with HRL Laboratories to license and manufacture HRL’s proprietary 40 nm T3L GaN-on-SiC process technology.&nbsp;</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44949</guid>
      <pubDate>Tue, 04 Nov 2025 09:47:49 -0500</pubDate>
      <link>https://www.microwavejournal.com/articles/44949-macom-to-manufacture-hrls-40-nm-gan-on-sic-process</link>
    </item>
    <item>
      <title>The 2026 IEEE/JSAP Symposium on VLSI Technology &amp; Circuits Announces Call for Papers</title>
      <description>
        <![CDATA[<p>The 2026 IEEE/JSAP Symposium on VLSI Technology & Circuits has announced a call for papers deadline of&nbsp;<span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">January 26, 2026</span> with the theme: “Advancing the AI Frontier through VLSI Innovation.” </p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44884</guid>
      <pubDate>Wed, 15 Oct 2025 10:08:44 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44884-the-2026-ieee-jsap-symposium-on-vlsi-technology-and-circuits-announces-call-for-papers</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/VLSI-symposium.webp?t=1760537625" type="image/jpeg" medium="image" fileSize="108098">
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    <item>
      <title>2025 IEEE IEDM to Showcase Latest Technologies in Microelectronics Under the Theme “100 Years of FETs: Shaping the Future of Device Innovations”</title>
      <description>
        <![CDATA[<p>Supporting the theme “100 Years of FETs: Shaping the Future of Device Innovations,” the 2025 IEDM technical program will consist of 295 presentations, plus a host of events that include Focus Sessions, Tutorials, Short Courses, an evening panel, a career luncheon, supplier exhibit and IEEE/EDS award presentations.&nbsp;</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44855</guid>
      <pubDate>Wed, 08 Oct 2025 16:21:18 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44855-2025-ieee-iedm-to-showcase-latest-technologies-in-microelectronics-under-the-theme-100-years-of-fets-shaping-the-future-of-device-innovations</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/IEDM-10-8-25.webp?t=1759955231" type="image/jpeg" medium="image" fileSize="72655">
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    <item>
      <title>Northrop Grumman Opens Access to U.S. Semiconductor Facilities</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">Northrop Grumman’s Microelectronics Center is now open for external aerospace and defense companies to access the company’s three U.S. government-accredited semiconductor manufacturing facilities.&nbsp;</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44772</guid>
      <pubDate>Thu, 18 Sep 2025 13:10:16 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44772-northrop-grumman-opens-access-to-us-semiconductor-facilities</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/NGC-9-18-25.webp?t=1758215731" type="image/jpeg" medium="image" fileSize="81895">
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    <item>
      <title>RapidRF - New Capabilities with UMS &amp; WIN GaAs Technologies</title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: center; widows: 2; word-spacing: 0px; display: inline !important; float: none;">RapidRF is expanding its technology portfolio with new GaAs Technologies from UMS and WIN now available on the RapidRF design platform.</span>
</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44755</guid>
      <pubDate>Tue, 16 Sep 2025 09:19:54 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44755-rapidrf-new-capabilities-with-ums-and-win-gaas-technologies</link>
      <media:content url="https://www.microwavejournal.com/ext/resources/images/Newsletters/News/News_1/rapidRF-9-16-25.webp?t=1758028941" type="image/jpeg" medium="image" fileSize="208631">
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    </item>
    <item>
      <title>GlobalFoundries Announces Production Release of 130CBIC SiGe Platform for High Performance Smart Mobile, Communication and Industrial Applications </title>
      <description>
        <![CDATA[<p>GlobalFoundries announced the production release of its 130 nm complementary Bi-CMOS platform, the company’s highest performance SiGe technology to date.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44655</guid>
      <pubDate>Thu, 28 Aug 2025 10:55:01 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44655-globalfoundries-announces-production-release-of-130cbic-sige-platform-for-high-performance-smart-mobile-communication-and-industrial-applications</link>
    </item>
    <item>
      <title>GlobalFoundries Announces Availability of 22FDX+ RRAM Technology for Wireless Connectivity and AI Applications </title>
      <description>
        <![CDATA[<p>At its annual Technology Summit in California,<strong>&nbsp;</strong>GlobalFoundries (GF) announced the availability of its 22FDX+ with Resistive RAM (RRAM) technology, marking a significant advancement in the company’s portfolio of eNVM solutions. </p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44654</guid>
      <pubDate>Thu, 28 Aug 2025 10:48:56 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44654-globalfoundries-announces-availability-of-22fdx-rram-technology-for-wireless-connectivity-and-ai-applications</link>
    </item>
    <item>
      <title>GlobalFoundries and Silicon Labs Partner to Scale Industry-Leading Wi-Fi Connectivity </title>
      <description>
        <![CDATA[<p><span style=" font-style: normal; font-weight: 400; letter-spacing: normal; orphans: 2; text-align: left; widows: 2; word-spacing: 0px; display: inline !important; float: none;">At its annual Technology Summit in California, GlobalFoundries (GF) announced a milestone for its 40 nm process technology through its partnership with Silicon Labs.</span></p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44653</guid>
      <pubDate>Thu, 28 Aug 2025 10:35:52 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44653-globalfoundries-and-silicon-labs-partner-to-scale-industry-leading-wi-fi-connectivity</link>
    </item>
    <item>
      <title>The Netherlands and Belgium: Crossroads of the European Microwave Industry</title>
      <description>
        <![CDATA[]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44566</guid>
      <pubDate>Mon, 11 Aug 2025 00:00:00 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44566-the-netherlands-and-belgium-crossroads-of-the-european-microwave-industry</link>
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      <title>How Sputtering Could Drive the Adoption of High Performance ScAlN-Based Transistors</title>
      <description>
        <![CDATA[<p>Tokyo University of Science researchers unveil the critical role of growth temperature in sputter epitaxy of scandium aluminum nitride (ScAlN) films on GaN heterostructures.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44586</guid>
      <pubDate>Fri, 08 Aug 2025 08:08:26 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44586-how-sputtering-could-drive-the-adoption-of-high-performance-scaln-based-transistors</link>
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    <item>
      <title>Indium Corporation Introduces New Flip-Chip Flux for Semiconductor Devices</title>
      <description>
        <![CDATA[<p>Indium Corporation announced the global availability of WS-910 Flip-Chip Flux, a new water-soluble flip-chip dipping flux designed to meet the demands of cutting-edge semiconductor devices.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44549</guid>
      <pubDate>Thu, 31 Jul 2025 09:45:22 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44549-indium-corporation-introduces-new-flip-chip-flux-for-semiconductor-devices</link>
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      <title>Semiconductor Foundry Landscape to Transform by 2030</title>
      <description>
        <![CDATA[<p>Yole Group unveils its latest Status of the Semiconductor Foundry Industry report, offering a comprehensive view into a sector undergoing profound transformation.</p>]]>
      </description>
      <guid>http://www.microwavejournal.com/articles/44383</guid>
      <pubDate>Tue, 24 Jun 2025 12:24:53 -0400</pubDate>
      <link>https://www.microwavejournal.com/articles/44383-semiconductor-foundry-landscape-to-transform-by-2030</link>
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