SUSS MicroTec has entered into a license agreement with Philips Research, Eindhoven, The Netherlands, for a new enabling technology called Substrate Conformal Imprint Lithography (SCIL). The aim of this cooperation is to bring an existing equipment platform with this additional Nanoimprint Lithography (NIL) feature to the market, enabling new approaches to large-area imprint applications along with excellent printing resolution and repeatability.

This new imprint technology for sub-50 nm patterning is bridging the gap between small rigid stamp application for best resolution and large-area soft stamp usage with the usual limited printing resolution below 200 nm. SCIL is an enabling technology that offers large-area soft stamps with repeatable sub-50 nm printing capability, avoiding stamp deformation as no contact force is applied, non-UV based curing at room temperature and allows high aspect ratios of 1:5 and above.

The lab aligner platform from SUSS MicroTec, handling 150 and 200 mm UV-lithography such as the MA6 and MA8, will be available and upgradeable with this feature. Market introduction with full implementation of the SCIL functionality into SUSS's lab aligners is scheduled for later this year.

“SCIL represents an enabling new technology that paves the way for further commercialization of nanoimprint lithography,” said Rolf Wolf, general manager of SUSS MicroTec lithography division. “This collaboration with Philips Research significantly broadens the range of nanoimprint lithography processes we can offer our customers.”